Manufacturing Technology
Nano micro circuit Technology
EDA TECHNOLOGIES

Nano thin-film coating and micro-pattern manufacturing technology

  • Micro-Pattern

    Nano micro circuit Realization

    customized calibration design

    measurable and analytical

  • From few micro units to Nano units Thin-film coating

    FILM, SILICON Special equipment available

  • Organic Materials Deposition

    TFT/LED/OLED

    depositing organic materials

Glass Wafer, Photomask, Film manufacturing technology

  2. Chrome mask

  3. Emulsion mask

  4. Film mask

  • Critical Dimension
  • 1 μm~
  • 15 μm~
  • 35 μm~
  • Dimension accuracy
  • 0.2 μm ≤
  • 1 μm ≤
  • 3 μm ≤
  • Line accurcy
  • ±0.1μm ~ ±1μm
  • ±2μm ~ ±3μm
  • ±2μm ~ ±3μm
  • POSITION accuracy
  • ±0.5μm < 20inch < ±5.0μm
  • ±5μm < 20inch < ±20μm
  • ±15μm < 20inch < ±50μm
  • Drawing Area
  • 5inch ~ 48inch
  • 5inch ~ 48inch
  • 5inch ~ 48inch
  • Thickness
  • 1.6T ~ 4.8T
  • 2.3T ~ 4.8T
  • 0.16 ~ 0.18mm

  2. Emulsion mask

  • Critical Dimension
  • 15 μm~
  • Dimension accuracy
  • 1 μm ≤
  • Line accurcy
  • ±2μm ~ ±3μm
  • POSITION accuracy
  • ±5μm < 20inch < ±20μm
  • Drawing Area
  • 5inch ~ 48inch
  • Thickness
  • 2.3T ~ 4.8T

  2. Film mask

  • Critical Dimension
  • 35 μm~
  • Dimension accuracy
  • 3 μm ≤
  • Line accurcy
  • ±2μm ~ ±3μm
  • POSITION accuracy
  • ±15μm < 20inch < ±50μm
  • Drawing Area
  • 5inch ~ 48inch
  • Thickness
  • 0.16 ~ 0.18mm